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  4. ข้อมูลวารสารวิชาการ

ชื่องานวิจัย ( Article Name)

CrAlN film hardness uniformity affected by nitrogen content

บทคัดย่อ ( Abstract )

For transition metal nitrides, nitrogen content is an important factor that determines properties of achieved coatings. In this work, chromium aluminum nitride (CrAlN) films were prepared by reactive dc co-sputtering and were investigated against variation of the nitrogen content. N2 gas flow rate was varied from 2.0 to 3.0 sccm for the nitrogen variation, whereas sputtering currents at both Cr and Al targets were fixed at 0.4 A. The CrAlN films were characterized by X-ray diffraction, field-emission scanning electron spectroscopy, energy-dispersive X-ray spectrometry, and nanoindentation. The results revealed that the increase of the N content led to target poisoning causing a reduction of Al fraction in the lattice of Cr1−xAlxN solid solution. Meanwhile, morphology of the CrAlN films became denser at the higher N content. Similarly, crystallinity of the film was improved by the increase of the nitrogen. With the enhancement of the crystalline structure and morphology, the CrAlN film with the higher N content showed improved hardness and elastic modulus with good uniformity.

เอกสารวิจัย ( Paper )

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ผู้เขียน ( Authors )

  • จิระวัฒน์ จันทรังษี
  • ชุติมา ภาคสัญไชย

ข้อมูลการเผยแพร่ ( Journal Infomation )